Enhanced high-order harmonic generation from Xe, Kr, and Ar in a capillary discharge

Enhanced high-order harmonic generation from Xe, Kr, and Ar in a capillary discharge

B. A. Reagan, T. Popmintchev, M. E. Grisham, D. M. Gaudiosi, M. Berrill, O. Cohen, B. C. Walker, M. M. Murnane, J. J. Rocca, and H. C. Kapteyn NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, Colorado 80523-1373, USA NSF ERC for Extreme Ultraviolet Science and Technology, Department of Physics and...

Enhanced High Harmonic Generation from Xe, Kr, and Ar in a Capillary Discharge

High-order harmonic generation from ions in a capillary discharge.

We demonstrate a significant extension of the high-order harmonic cutoff by using a fully-ionized capillary discharge plasma as the generation medium. The preionized plasma dramatically reduces ionization-induced defocusing and energy loss of the driving laser due to ionization. This allows for significantly higher photon energies, up to 150 eV, to be generated from xenon ions, compared with th...

High-order harmonic generation in Xe, Kr, and Ar driven by a 2.1-m source: High-order harmonic spectroscopy under macroscopic effects

Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. The MIT Faculty has made this article openly available. Please share how this access benefits you. Your story matters. We experimentally and numerically study the atomic response and pulse propagation effects of high-order harmonics g...

High power ultrafast laser design and high-order harmonic generation in capillary discharge plasmas

2007 This thesis entitled: High power ultrafast laser design and high-order harmonic generation in capillary discharge plasmas written by David M. Gaudiosi has been approved for the Department of Physics Date The final copy of this thesis has been examined by the signatories, and we find that both the content and the form meet acceptable presentation standards of scholarly work in the above men...